Leica DM3 XL
The Inspection System for Microelectronics and Semiconductor DM3 XL -  LEICA MICROSYSTEMS

Description

Speed matters in inspection, process control, or defect and failure analysis for the microelectronics and semiconductor industry. The faster you detect a defect, the faster you can react. With a large field of view, the DM3 XL inspection system allows your team to identify defects faster and increase your yield rate. Make use of the 30% increased field of view of the unique macro objective. Additionally, the DM3 XL uses LED illumination for all contrast methods. LED illumination provides a constant color temperature and offers real color imaging at all intensity levels. - Increase your yield - Reliably detect insufficient development at the edge or within the center of a wafer - Detect uneven radial film thickness - True-to-life color imaging at all intensity levels - Reproducible results

Engine testing and regulating equipment - electronic
Ernst-Leitz-Strasse 17-37, 35578 Wetzlar
Germany
Request a quote
  • Max. 3000 characters

  • Your address details
  • I agree to the EUROPAGES  terms and conditions and  privacy policy

  • Click to see
OTHER PRODUCTS FROM THIS COMPANY