Leica DM3 XL

The Inspection System for Microelectronics and Semiconductor DM3 XL

Description

Speed matters in inspection, process control, or defect and failure analysis for the microelectronics and semiconductor industry. The faster you detect a defect, the faster you can react. With a large field of view, the DM3 XL inspection system allows your team to identify defects faster and increase your yield rate. Make use of the 30% increased field of view of the unique macro objective. Additionally, the DM3 XL uses LED illumination for all contrast methods. LED illumination provides a constant color temperature and offers real color imaging at all intensity levels. - Increase your yield - Reliably detect insufficient development at the edge or within the center of a wafer - Detect uneven radial film thickness - True-to-life color imaging at all intensity levels - Reproducible results

Domain icon Manufacturer/ Producer

35578 Wetzlar - Germany

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