Molybdenum sputtering target

Aluminum is used for PVD metallization in thin-film transistors for TFT-LCD for displays. Aluminum sputtering targets are highly pure and therefore ensure best conductivity of the material. The aluminum targets have a particularly fine-grained microstructure. This ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process. Material properties: Density [g/cm3]: > 2,70 Purity [%] > 99,999 (5N) Hardness [HV1]: 16 Thermal conductivity [W/(m·K)]: 238

Tungsten layers are components of the thin-film transistors used in TFT-LCD screens. They are used wherever large screen formats, particularly high image definition and optimized contrasts are needed. But tungsten is also used as a diffusion barrier and a conductive connector in the microelectronics industry. Using the world's largest hot rolling mill for refractory metals, Plansee is able to produce the largest tungsten sputtering target on earth. The benefit to you of large formats: The coating process is more stable and the deposited layers are of higher quality. Thanks to the special forming processes Plansee's tungsten sputtering targets have a density of almost 100 %. As a result, your process benefits from a particularly high level of conductivity and time savings due to the excellent sputtering speeds.

Plansee produces material for wear-resistant coatings, adhesive layers, decorative or DLC coatings. Offering compositions tailored for advanced hard coatings with optimized mechanical and tribological properties. Further topics that might be addressed are: enhancing of thermal and chemical stability, adding of functional properties like self-lubrication, self-hardening and self-healing. To adjust the coating characteristics to the dedicated application, Plansee offers its scientific expertise in alloying of targets and cathodes with elements that influence the coating properties as follows: Grain size and morphology, Hardness adaption, High temperature oxidation resistance, Friction coefficient, Thermal stability, Thermal conductivity, Electrical conductivity, Antibacterial properties, Color effects. Offered sputtering targets and arcing cathodes: Titanium-Aluminum Aluminum-Chromium Chromium Titanium-silicon Titanium Zirconium Tungsten carbide Titanium-diboride

Metallic hot zones are made for very high temperatures between 1000 °C (1 832°F) and 2 800 °C (5 072 °F). As a specialist in refractory metals Plansee delivers molybdenum and tungsten hot zones with an excellent form stability and lifetime. Plansee designs and produces hot zones for various types of furnaces (vacuum, protective gas atmosphere, HIP etc) and thermal processes such as sintering, brazing or annealing. Hot zones consist of countless individual parts such as heating elements, shield packs and hearth assemblies and charge carriers. You can find all of these components at Plansee. - Hot zones made from molybdenum, tungsten, tantalum, niobium and their alloys - Full metal or hybrid hot zones with graphite or ceramic fiber insulation - From very small (a few cm³) through to very large (several m³) hot zones - For temperatures of between 1000°C (1832°F) and 2800°C (5072°F) - Tailor-made design: round, rectangular, vertical, horizontal or special geometries