Aluminum sputtering target

Tungsten layers are components of the thin-film transistors used in TFT-LCD screens. They are used wherever large screen formats, particularly high image definition and optimized contrasts are needed. But tungsten is also used as a diffusion barrier and a conductive connector in the microelectronics industry. Using the world's largest hot rolling mill for refractory metals, Plansee is able to produce the largest tungsten sputtering target on earth. The benefit to you of large formats: The coating process is more stable and the deposited layers are of higher quality. Thanks to the special forming processes Plansee's tungsten sputtering targets have a density of almost 100 %. As a result, your process benefits from a particularly high level of conductivity and time savings due to the excellent sputtering speeds.

Plansee produces material for wear-resistant coatings, adhesive layers, decorative or DLC coatings. Offering compositions tailored for advanced hard coatings with optimized mechanical and tribological properties. Further topics that might be addressed are: enhancing of thermal and chemical stability, adding of functional properties like self-lubrication, self-hardening and self-healing. To adjust the coating characteristics to the dedicated application, Plansee offers its scientific expertise in alloying of targets and cathodes with elements that influence the coating properties as follows: Grain size and morphology, Hardness adaption, High temperature oxidation resistance, Friction coefficient, Thermal stability, Thermal conductivity, Electrical conductivity, Antibacterial properties, Color effects. Offered sputtering targets and arcing cathodes: Titanium-Aluminum Aluminum-Chromium Chromium Titanium-silicon Titanium Zirconium Tungsten carbide Titanium-diboride

Molybdenum sputtering targets are used for the manufacture of thin-film transistors used in TFT-LCD screens. Targets from Plansee are maximum dense, highly pure and show a homegenous microstructure. Therefore higher sputtering speeds, minimized particle formation during the process and homogenous layers are guaranteed. Available molybdenum alloys: MoTa, MoNb, MoNa, MoW You can choose between our single and multi-piece planar targets. Planar targets are available for all commonly used systems as well as to specific customer needs. Rotary targets are available too.

Evaporation coils are available in many different lenghts, diameters, coil lenghts and coil pitches. These resistance heaters with their very high melting points will bring practically any metal to the boil. At the same time, their high corrosion resistance and outstanding material purity prevent any contamination of the substrate. The range includes evaporation coils made of the following materials: — Grain stabilized tungsten (WVM) for the evaporation of aluminum — Tantalum — Molybdenum — Molybdenum-lanthenum (ML) for particularly long service lives