INFICON AG

FIND PROFIT-CRUSHING LEAKS IN NO TIME D-TEK Stratus combines the superior leak detection of INFICON D-TEK leak detectors with the cloud hunting capability of a portable monitor all in one hand-held unit. Quickly locate the area containing the leak using the large, easy-to-read LCD display, and then pinpoint the leak all with one instrument! D-TEK Stratus is the next big thing in refrigerant leak detection. All new, redesigned infrared sensor New lithium ion battery

Simplify and Accelerate Gas Analysis Micro GC Fusion offers significant throughput gain through rapid temperature ramping and modular architecture. The transportable, lightweight chassis and web-based user interface enables simplified operation for both on-site and in-lab gas analysis. Need application assistance? Click here! Need a Safety Data Sheet (formerly MSDS)? Click here! SO 2 and H 2S gas monitoring Permanent gases and olefins in refinery gas Impurities in petrochemical products and specialty gases Solvent/VOC gas monitoring Catalyst research for alternative energy

INFICON Crystals are 100% Tested for Accuracy and Reliability The quality and longevity of a crystal affect not only the accuracy of rate and thickness measurements, but more importantly the successful completion of the process being controlled. INFICON quartz crystals offer proven quality and reliability-proven by millions of successful process runs with a wide range of materials, applications and industries. Our 6 MHz crystals are used with all INFICON controllers and monitors. Our 5 MHz crystals can be used with 5MHz instruments only; and are not compatible with some INFICON instruments. The 6 MHz and the 5 MHz crystals are available in gold, silver or alloy electrodes and come in a variety of packages depending on your needs. The INFICON clean room quartz crystal package enables convenient dispensing of the crystals directly from the package to the sensor, minimizing operator handling and risk of contamination. To make the crystal package more cleanroom-friendly, we...

MONITOR AND CONTROL RAPID PROCESS CHANGES The new Transpector XPR 3+ Residual Gas Analyzer (RGA) provides industry-leading measurement speeds to monitor and control the rapid process changes required for modern semiconductor and display manufacturing. Transpector XPR 3+ is ideal for in-situ air leak, gas purity, hydrocarbon, and contamination monitoring. Real time measurement with the Transpector XPR 3+ provides far superior product protection compared to periodic rate of rise tests. DRIVNG PROFITABILITY BY MAXIMIZING TOOL UPTIME The Transpector XPR 3+ RGA is a field proven quadruple and dual ion source sensor for sputtering pressure range applications. No pressure conversion equipment is required, long lifetime components, and the ability to rapidly detect and diagnose problems combine to maximize tool availability, product throughput and yield. The sensor can be operated continuously from high vacuum to 20 mTorr, without the need for pumps. The Transpector XPR 3+ dual ion...

Self-Contained Cart for Mobile Troubleshooting The INFICON Mobile Cart allows the Transpector CPM (Compact Process Monitor) to become a mobile troubleshooting instrument. The self-contained cart allows the system to be transported from tool to tool with the flexibility to adjust to various tool heights. the mechanical arm mechanism permits the sampling system to twist, rotate and move vertically which makes this Mobile Cart perfect for tight production spaces.

Real-time Endpoint Detection and Leak Detection The INFICON Quantus LP100 Gas Analyzer provides real-time leak detection and endpoint detection for your critical process environments. Many processes are sensitive to leaks or require endpoint detection. The Quantus LP100 is a gas analyzer that is designed to react to small changes in sensitive process environments in real-time so that scrap is minimized and yields are improved.

Tool Management, Process Specific INFICON Sensor Integration and Analysis Systems provide process verification and control, including run-to-run control of key process parameters for process optimization and immediate and automatic feedback to the process equipment or a process engineer on any faults detected and their probable cause. FabGuard Sensor Integration and Analysis System takes data from in situ sensors, integrates that data with data from the process equipment itself, and condenses and analyzes it to provide the process engineer with actionable information. Alternatively, the engineer can choose to have FabGuard automatically send control commands directly to the process equipment. Powerful Data Management for Enhanced Productivity Make your fab's data work for you. The FabGuard Sensor Integration and Analysis System enhances tool productivity, by providing process control, and reducing losses from process drift, contamination, tool malfunction, or unnecessary test...

NON-INVASIVE, CLAMP-ON RF DETECTOR DELIVERS HIGH-SPEED ARC DETECTION IN iPVD, PECVD AND ETCH Reducing Wafer Loss and Improving Yields Arcing during plasma processing can result in target and chamber damage leading to substrate damage and particle creation. As feature sizes decrease, microelectronic devices become increasingly susceptible to arc-induced damage. Arcing can occur in any plasma assisted process such as ionized Physical Vapor Deposition (iPVD), Plasma Enhanced Chemical Vapor Deposition (PECVD) and Etch. The INFICON Sion Arc Detector provides a crucial first line of defense. Sion makes it possible to detect micro-arcs quickly and react to them before significant damage or scrap occurs. The system provides real-time detection and analysis of plasma micro-arcing events.

Sion™ RF Detector gives you tighter control and higher yields in chemical vapor deposition (CVD) and etch processes by reliably and accurately determining the chamber clean endpoint. More accurate endpointing means lower on-wafer particle levels and more time between preventative maintenance cycles. Providing a number of advantages over optical emission spectrometer (OES)-based controllers, Sion works with FabGuard® Integration and Analysis System to reduce the wasted time and materials that result from chamber clean under- or over-etching.

RF Sensor with FabGuard Provides Real-time Plasma Process Analysis to Significantly Reduce Process Variability INFICON RF sensor technology provides highly accurate, broadband, frequency discriminant RF measurement for semiconductor processing tools. This RF data provides detailed insight on actual plasma conditions of both process development and production process problems to significantly reduce process variability. The latest in its suite of advanced process control in situ sensors, this non-intrusive in-line cable mount RF sensor combines with FabGuard Sensor Integration and Analysis Systemto offer critical diagnostic information, e.g. accurate chamber and process power and impedance measurement, root cause analysis of faults (such as matching network problems), process fingerprinting for chamber matching, and wafer metrology modeling in PVD, CVD and etch applications. INFICON RF sensor technology with FabGuard generates highly accurate models that predict wafer metrology...